The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…
By James Paris, Mentor Graphics Back-annotation of DFM enhancements to P&R simplifies iterations as designers close timing and physical verification
By Michael White, Mentor Graphics Integrating pattern matching with design verification and process development yields benefits at all nodes. Learn…
By Jeff Wilson, Mentor Graphics Companies designing automotive electronics must understand how variability affects design quality and reliability.
By Jeff Wilson, Mentor Graphics With manufacturing innovations and new DFM solutions, CMP modeling is gaining renewed popularity
By Jeff Wilson, Mentor Graphics At 20nm, new fill constraints drive up the time and complexity of the fill process….
A video introduction to Mentor’s newly introduced utility called ecofill.
By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and reduces yield variability over its…
By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid approach helps designers prioritize and…
