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GLOBALFOUNDRIES and Mentor Launch a New Innovative DRC+ Hotspot Solution using Machine Learning in Calibre

By Shelly Stalnaker – Mentor, A Siemens Business I recently had the chance to attend an on-demand webinar introducing the…

Mentor receives 2020 TSMC OIP Partner of the Year awards for EDA solutions

By Shelly Stalnaker – Mentor, A Siemens Business While the structure of the TSMC OIP Ecosystem Forum had to change…

Verification run configurations stressing you out? Automate them!

By Srinivas Velivala – Mentor, A Siemens Business As all new IC verification engineers learn very quickly, there is far…

SAFE at home! Attending the Samsung SAFE forum in 2020

By Shelly Stalnaker – Mentor, A Siemens Business Samsung is going virtual with their 2020 SAFE forum, and Mentor, a…

Do you have a reliable automated waiver process for reliability verification?

By Dina Medhat – Mentor, A Siemens Business Design rule waivers Maybe a design rule that made sense at 22nm…

SAMP series finishes with SAMP cut mask decomposition techniques

By David Abercrombie and Rehab Kotb Ali – Mentor, A Siemens Business We’ve been writing about self-aligned multi-patterning (SAMP) topics…

Breaking it down…How interconnect segmentation helps resolve P2P resistance errors

Breaking it down…How interconnect segmentation helps resolve P2P resistance errors

By Slava Zhuchenya – Mentor, A Siemens Business Point-to-point (P2P) simulations find and report nets that exceed predefined resistance thresholds…

VLSI optimization—a bridge too far?

VLSI optimization—a bridge too far?

source: Andrew Shiva/CC BY-SA 4.0By Sherif Hany – Mentor, A Siemens Business Job without end. How about job done? Have…

A better, faster, smarter way to insert filler cells in P&R

A better, faster, smarter way to insert filler cells in P&R

By Fady Fouad, Jeff Wilson, Esraa Swillam – Mentor, A Siemens Business Filler cells—Those cells inserted by the P&R tool…