By Le Hong As semiconductor components continue to shrink, the challenges associated with design-for-manufacturing (DFM) and design-technology co-optimization (DTCO) increase….
By Armen Asatryan, James Paris DFM back-annotation to P&R Back-annotation of DFM changes to P&R databases can be a pain….
By Shelly Stalnaker – Mentor, A Siemens Business I recently had the chance to attend an on-demand webinar introducing the…
Calibre Pattern Matching enables innovative DRC and other applications across all process nodes and designs.
By James Paris, Mentor Graphics Back-annotation of DFM enhancements to P&R simplifies iterations as designers close timing and physical verification
By Michael White, Mentor Graphics Integrating pattern matching with design verification and process development yields benefits at all nodes. Learn…
By Jeff Wilson, Mentor Graphics Companies designing automotive electronics must understand how variability affects design quality and reliability.
By Jeff Wilson, Mentor Graphics With manufacturing innovations and new DFM solutions, CMP modeling is gaining renewed popularity
By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and reduces yield variability over its…
