The SPIE Advanced Lithography + Pattering symposiums were held from 25-29 February this year with enthusiastic and sizable attendance. The…
By John Sturtevant It turns out that the ideal mask pattern to print such a circle is in fact a…
The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…
By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.
